7N tellurium crystal incrementum et purificationem

Nuntium

7N tellurium crystal incrementum et purificationem

7N tellurium crystal incrementum et purificationem


I. Rudis Material Pretreatment et Primae purificationis

  1. Rudis Material Electio et Crushing
  • Materia requiruntur: Usus tellurium ore vel Anode lotus (te content ≥5%), potissimum aeris odorat anode slime (quibus cuǽte, cu₂se) ut rudis materia.
  • Pretreatment Processus:
  • Crassum adtritis particula magnitudine ≤5mm secutus pila milling ad ≤200 reticulum;
  • Magna separationem (Magnetic ager intensionem ≥0.8t) ad removendum fe, ni et alia magnetica impudicitiis;
  • Thomas flotation (PH = 8-9, Xanthate collectores) ad separandum sio₂, cuo et alia non-magnetica impudicitiis.
  • Cautiones: Vitare introducendis humorem durante infectum preteratment (exigit siccatio ante torrendum); Imperium ambientium Umor ≤30%.
  1. Pyrometallurgical torrendum et oxidatio
  • Processus parametri:
  • Oxidatio torrendum temperatus: 350-600 ° C (ridiculo imperium: humilis temperatus ad Desulfurization, summus temperatus ad oxidatio);
  • Tumor tempus: 6-8 horis, cum O₂ rate of 5-10 l / min;
  • Reagent: concentrated sulfuric acidum (XCVIII% H₂so₄), Missam Ratio te₂so₄ = I, 1.5.
  • Eget reactionem:
    Cu2te + 2o2 + 2h4So4 → 2Co2 + + 2H2ocu2 te + 2,2 + 2H2 SO4 → 2Coo4 + + + 2H2 o
  • Cautiones: Imperium temperatus ≤600 ° C ne Teo₂ volatilizationis (ferventis Point CCCLXXXVII ° C); Tractare exhauriunt Gas cum Naoh scrutros.

II. Electrorfining et vacuo distillation

  1. Electrorefining
  • Electrolyte System:
  • Electrolyticensis compositionem: H₂so₄ (80-120g / l), Teo₂ (40-60g / L), ELOGIUM (GELATINI 0.10.3G / L);
  • Temperature Imperium: 30-40 ° C, circulationem rate 1.5-2 mww / h.
  • Processus parametri:
  • Current density: 100-150 A / M², cellula voltage 0.2-0.4V;
  • Electrode spacing: 80-120mm, cathode depositione crassitudine 2-3mm / 8h;
  • Impuram remotionem efficientiam: CU ≤5ppm, PB ≤1ppm.
  • Cautiones: Regulariter filter electrolyticis (accuracy ≤1μm); Mechanice Poloniae Anode Superficierum ne passivation.
  1. Vacuum Distillation
  • Processus parametri:
  • Vacuum Level: × 10⁻²pa ×, 600-650 Distillation Temperature ° C;
  • Condenser Zonam Temperature: 200-250 ° C, Te vapor Condensitas efficientiam ≥95%;
  • Distillation Time: 8-12h, unum-batch facultatem ≤550kg.
  • Immunditia distribution: Minimum-ferventis impurities (se, s) cumulare ad condenser frontem; High-ferventis impurities (PB, AG) in residua.
  • Cautiones: Pre-sentinam vacuo system ad ≤5 × 10⁻⁻pa ante calefactio ne te oxidatio.

III. Crystal augmentum (Directional Crystallization)

  1. Apparatu configuratione
  • Crystal incrementum fornacem exempla: TDR-70a / B (30kg facultatem) vel Trdl DCCC (60kg facultatem);
  • Crucible materia: summus puritas graphite (cinis contentus ≤5ppm), dimensiones φ300 × 400mm;
  • Calefactio modum: Graphite resistentia calefactio, maximum temperatus MCC ° c.
  1. Processus parametri
  • Imperium:
  • Melting Temperature: 500-520 ° C, Melt Laptem profundum 80-120mm;
  • Protective Gas: Ar (puritate ≥99.999%), fluunt rate 10-15 l / min.
  • Crystallization parametri:
  • Tollens rate: 1-3mm / h, Crystal Rotation celeritate 8-12rpm;
  • Temperatus CLIVUS: Axial 30-50 ° F / cm, radiale ≤10 ° F / cm;
  • Refrigerant Methodo: aqua-refrigeratum aeris basi (aqua temperatus 20-25 ° C), summo radiative refrigerationem.
  1. Imperium immunditia
  • Segregatio: Imbrensis sicut FE, ni (segregationem coefficient <0.1) cumulare ad frumentum terminos;
  • Remelting CYCLES: 3-5 Cycles, ultima summa impurities ≤0.1ppm.
  1. Cautiones:
  • Operculum conflandum superficies cum graphite laminas ad supprimere te volatilizationis (damnum rate ≤0.5%);
  • Monitor crystallum diameter in ipsa tempus usura laser Gauges (accuracy ± 0.1mm);
  • Vitare temperatus fluctus> ± II ° C ne peccet density crescat (target ≤10³ / C²).

IV. Qualis inspectionem et clavem metrics

Test item

Vexillum pretii

Test modus

Fons

Pudicitia

≥99.99999% (7n)

ICP-MS

Total Metallic Impura

≤0.1ppm

GD-MS (Missa Missam Spectrometry)

Oxygeni

≤5ppm

Inert Gas eget, IR effusio

Crystalli integritas

Luxatio density ≤10³ / C²

X-Ray Topography

Resistentibus (300k)

0.1-0.3Ω · cm

Quattuor-Probe modum


V. Environmental et salus protocols

  1. Exhauriunt Gas curatio:
  • Tumor exhaurit: corrumpere soeo₂ et Naoh Scrobbers (PH);
  • Vacuum distillation exhauriunt: condense et recuperet te vapor; RELICTUM vapores adsorbed via activated ipsum.
  1. Sirus redivivus:
  • UNDO Slime (quibus AG, AU): Recipe per Hydrometalluralgy (H₂so₄, HCL ratio);
  • Electrolysis residua (quibus PB, cu), reditus ad aeris detractatione systems.
  1. Salus mensuras:
  • Operators oportet gerunt gas larvis (te vapor est toxicus); Ponere negans pressura VENTILATIO (Aeris commutationem rate ≥10 cycles / h).

Processus Optimization Guidelines

  1. Rudis materiam accommodatio: Adjust tormentum temperatus et acidum ratio dynamically fundatur in Anode Slime Sources (eg, aeris vs. plumbum lumbi);
  2. Crystal trahens rate matching: Adjust trahens celeritate secundum solvendos (Reynolds Number re≥2000) ad supprimere constitutionalis supercooling;
  3. Efficientiam industria: Usus Dual-temperatus zone calefactio (Main Zonam D ° C, sub-Zonam CD ° C) ad redigendum Graphite resistentia potentia consummatio per XXX%.

Post tempus: Mar-24-2025